Answers (3)

baber 02-09-2012
baber - Jaypee University of Engineering & Technology
It a material that can be chemically tramsformed and removed from surface of work.
bholaa 02-09-2012
bholaa - Jaypee University of Engineering & Technology
A photoresist is a masking material that is sensitive to light. When exposed, it chemically transforms and can be removed from the surface of the work, leaving the desired surface unprotected by the maskant.

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