A commonly used orientation- dependent etch for silicon consists of a mixture of KOH in water and isopropyl alcohol. Source: [http:...
The actual ensuing etching-charge per unit database will allow mathematical prevision associated with etching single profiles regarding silicon, need...
The first etching operations utilized fluid-form ("damp") etchants. The actual wafer can be engrossed in the bathing tub associated with etchant, tha...