National Institute of Industrial Engineering, Engineering, Electrical Engineering
• In physical etching, positive ions bombard the surface at high speed; small amounts of negative ions formed in the plasma cannot reach the wafer su...
Volume interactions: The actual Debye testing size (described previously mentioned) is brief when compared to the actual size of the plasma. This spe...
Plasma is produced when an electric field of sufficient magnitude is applied to a gas, causing the gas to break down and become ionized. Source...