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The university of california, berkeley eecs 130 midterm 2 exam from november 10, 1998, focusing on mosfet and mos capacitor problems. Students are required to find physical constants, determine substrate types, gate oxide thicknesses, substrate doping concentrations, and analyze c-v curves, among other tasks.
Typology: Exams
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UNIVERSITY OF CALIFORNIA AT BERKELEY College of Engineering Department of Electrical Engineering and Computer Science EECS 130 Midterm # Nov. 10th, 1998 Prof. C. Hu NAME: SID: (Close book. One sheet of notes of Chapters 8-18 allowed) Physical Constants Electronic Charge ^ ^ C Permittivity of Vacuum
F cm Free Electron Mass ^ !^ "#^ kg Boltzmannโs Constant $
eV K Physical Constants for Si and SiO ( Si Intrinsic Carrier Concentration )+* !^
cm " Si Bandgap , g Si -%^ eV Si Electron affinity. Si / ^ eV Diaelectric constant of Si Si
Dielectric constant of SiO( 3254 6 Problem 1 / 20 Problem 2 / 24 Problem 3 / 16 Problem 4 / 20 Problem 5 / 20 Total / 100
. 8 9;: (^) / pF, 8 :<
pF. C 1 C 0 C (pF) Vg โV (a) ( 3 pts ) What is the substrate type? (b) ( 5 pts ) Find >?254 , the gate oxide thickness. (c) ( 7 pts ) Find the substrate doping concentration @BAC5D. (d) ( 5 pts ) If due to oxide fixed charge, the C-V curve shifted from the solid line to the dashied line, with EGF : H=^ V, what is the type and area density (C cm
) of the oxide fixed charge?
mA at F+AI:`6 V. (a) ( 8 pts ) Ignoring velocity saturation, find 7 \a , estimate JK\A-]T at FPA&: % V. (b) ( 12 pts ) Now consider the effect of velocity saturation, with ,bA] Tc:d
V cm, use the same 7 \a as in part (a), find JK\A-]T and FPK\A] T at FP_AG: % V and at FP_AG:Y6 V respectively.