EECS 130 Midterm 2: MOSFET and MOS Capacitor Questions, Exams of Electrical Engineering

The university of california, berkeley eecs 130 midterm 2 exam from november 10, 1998, focusing on mosfet and mos capacitor problems. Students are required to find physical constants, determine substrate types, gate oxide thicknesses, substrate doping concentrations, and analyze c-v curves, among other tasks.

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UNIVERSITY OF CALIFORNIA AT BERKELEY
College of Engineering
Department of Electrical Engineering and Computer Science
EECS 130 Midterm #2
Nov. 10th, 1998
Prof. C. Hu
NAME:
SID:
(Close book. One sheet of notes of Chapters 8-18 allowed)
Physical Constants
Electronic Charge
๎˜€ ๎˜๎˜ƒ๎˜‚๎˜…๎˜„๎˜‡๎˜†๎˜ˆ๎˜๎˜Š๎˜‰๎˜Œ๎˜‹๎˜Ž๎˜๎˜๎˜
C
Permittivity of Vacuum
๎˜‘๎˜“๎˜’ ๎˜”
๎˜‚
๎˜”๎˜–๎˜•
๎˜†๎˜ˆ๎˜๎˜—๎˜‰๎˜˜๎˜‹๎˜Ž๎˜๎˜š๎˜™
F
๎˜›
cm
Free Electron Mass
๎˜œ๎˜๎˜’ ๎˜ž
๎˜‚๎˜Ÿ๎˜ ๎˜!๎˜†๎˜ˆ๎˜๎˜—๎˜‰ ๎˜‹๎˜˜"#๎˜
kg
Boltzmannโ€™s Constant
$ ๎˜”
๎˜‚๎˜…๎˜„๎˜–%&๎˜†๎˜ˆ๎˜๎˜—๎˜‰ ๎˜‹๎˜˜'
eV
๎˜›
K
Physical Constants for Si and SiO
(
Si Intrinsic Carrier Concentration
)+*
๎˜!๎˜†๎˜ˆ๎˜๎˜—๎˜‰ ๎˜
๎˜’
cm
๎˜‹๎˜˜"
Si Bandgap
,
g
๎˜‹
Si
๎˜๎˜ƒ๎˜‚๎˜Ÿ๎˜-%
eV
Si Electron affinity
.
Si
/
๎˜‚๎˜…๎˜‰
๎˜•
eV
Diaelectric constant of Si
๎˜‘
Si
๎˜๎˜ƒ๎˜ ๎˜‚10
Dielectric constant of SiO
( ๎˜‘3254 6
๎˜‚
๎˜ž
Problem 1 / 20
Problem 2 / 24
Problem 3 / 16
Problem 4 / 20
Problem 5 / 20
Total / 100
pf3
pf4
pf5

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UNIVERSITY OF CALIFORNIA AT BERKELEY College of Engineering Department of Electrical Engineering and Computer Science EECS 130 Midterm # Nov. 10th, 1998 Prof. C. Hu NAME: SID: (Close book. One sheet of notes of Chapters 8-18 allowed) Physical Constants Electronic Charge ^  ^ C Permittivity of Vacuum  

F cm Free Electron Mass   ^ !^ "#^ kg Boltzmannโ€™s Constant $ 

eV K Physical Constants for Si and SiO ( Si Intrinsic Carrier Concentration )+* !^

cm " Si Bandgap , g Si -%^ eV Si Electron affinity. Si / ^  eV Diaelectric constant of Si Si

Dielectric constant of SiO(  3254 6  Problem 1 / 20 Problem 2 / 24 Problem 3 / 16 Problem 4 / 20 Problem 5 / 20 Total / 100

  1. ( 20 pts ) Consider the C-V curve of a MOS capacitor in the figure (the solid line), the capac- itor area is 6400 7 m

. 8 9;: (^) /  pF, 8 :<

pF. C 1 C 0 C (pF) Vg โˆ†V (a) ( 3 pts ) What is the substrate type? (b) ( 5 pts ) Find >?254 , the gate oxide thickness. (c) ( 7 pts ) Find the substrate doping concentration @BAC5D. (d) ( 5 pts ) If due to oxide fixed charge, the C-V curve shifted from the solid line to the dashied line, with EGF : H=^  V, what is the type and area density (C cm

) of the oxide fixed charge?

  1. ( 16 pts ) In the following JK vs. F5L curve, assume >M254N:< A and FO is small: I (^) d (V = -3 V)BS I (^) d (V = 0 V)BS ID V g(V) 0 1 2 3 0.E+ 2.E- 4.E- 1.E- 8.E- 6.E- (a) ( 6 pts ) What is the threshold voltage at FPDPA:RQS6 V? (b) ( 10 pts ) Determine the substrate doping concentration.
  1. ( 20 pts ) Consider a MOSFET, given F5T: U10^ V, V :  7 m, W<: H^6 X7 m, >?24Y:Z A and J[K\A] T^:

 mA at F+AI:`6 V. (a) ( 8 pts ) Ignoring velocity saturation, find 7 \a , estimate JK\A-]T at FPA&: % V. (b) ( 12 pts ) Now consider the effect of velocity saturation, with ,bA] Tc:d

N 

V cm, use the same 7 \a as in part (a), find JK\A-]T and FPK\A] T at FP_AG: % V and at FP_AG:Y6 V respectively.