X-ray Characterization: Scattering Techniques and Diffraction in Material Science, Study notes of Physics

An overview of x-ray characterization techniques, focusing on scattering methods and diffraction principles. Topics include x-ray generation, line spectrum and characteristic x-rays, absorption and filtering, bragg's law, and allowed diffractions. It also covers diffraction intensity, peak width, and common xrd techniques.

Typology: Study notes

Pre 2010

Uploaded on 07/30/2009

koofers-user-ix7
koofers-user-ix7 🇺🇸

10 documents

1 / 16

Toggle sidebar

This page cannot be seen from the preview

Don't miss anything!

bg1
Characterization: XCharacterization: X
--
rayray
Characterization:
XCharacterization:
X
rayray
pf3
pf4
pf5
pf8
pf9
pfa
pfd
pfe
pff

Partial preview of the text

Download X-ray Characterization: Scattering Techniques and Diffraction in Material Science and more Study notes Physics in PDF only on Docsity!

Characterization: XCharacterization: X

- -rayray

Characterization: XCharacterization: X ray

ray

Scattering TechniquesScattering Techniques

Liu, UCD 250-2, 2009, NanoFab

2

Line SpectrumLine Spectrum

Characteristic x

-ray:

Characteristic x ray:

unique to element X-ray

Liu, UCD 250-2, 2009, NanoFab

4

Cu LinesCu Lines

Liu, UCD 250-2, 2009, NanoFab

5

Absorption/FilteringAbsorption/Filtering^ x

eI

I

 ^

)/ ( ^

(^33)

/^

Z k^ ^

M^

b^

ti^

ffi i

t

o x^

eI

I^

^

(^33)

/^

Z k^   ^

^

Mass absorption coefficient

x : thickness

– Absorption coefficient (cm

-1)

1/^

  • One absorption length

Liu, UCD 250-2, 2009, NanoFab

7

DiffractionDiffraction

Scalar description:

Bragg’s Law:

2dsin

 =n

Vector description:

Laue conditions:

k

= k

  • ko = G - necessary

Liu, UCD 250-2, 2009, NanoFab

8

o^

y

q-value: |

k

^4^ 

sin

 /^ 

Polycrystalline NaClPolycrystalline NaCl Why no (210), (211)…?

Liu, UCD 250-2, 2009, NanoFab

10

Structure FactorStructure Factor

)

( 2

n n n^

lw kv hui

N

n

hkl^

ef

F^

 

1

electron one by

scattered wave the of

amplitude

cell unita in atoms the all by

scattered wave the of

amplitude | |^

F e.g.: fcc lattice, 4 sam e atom s at (0, 0, 0), ( ½ , ½ , 0), (½ , 0, ½ ) and (0, ½ , ½ ).

]

(^1) [^

)( )( ) (^

kli lki khi

f F^

  

  ^

0 if

h^ k^ l^

ll^ dd^

electronll one by

scattered wave the of

amplitude

]

(^1) [^

)( )( ) (^

kli lki khi

hkl^

e e e f F^

  ^

   

  ^

(^0)  if^ h

, k, l

are all odd or all even

Allowed diffraction:Allowed diffraction:

fcc:

all odd or all even bcc:

h+k+l=even

Liu, UCD 250-2, 2009, NanoFab

11

Diffraction IntensityDiffraction Intensity

 

M e A^

2

2

2

2

cos sin

2 cos 1 p| F|

   

^  

Structure factor FMultiplicity factor pMultiplicity factor pLorentz factor Absorption factor A(

Debye-Waller (temperature) factor

Liu, UCD 250-2, 2009, NanoFab

13

Peak WidthPeak Width

Scherrer formulaFWHM

(^

di^

 88

. 0

FWHM=

(radian)  cos D

Sources for broadening

SizeSizeInstrument widthStress Liu, UCD 250-2, 2009, NanoFab

14

Phase IdentificationPhase Identification

Account for all peaks:

positionl ti

i t

it

Liu, UCD 250-2, 2009, NanoFab

16

relative intensitypeak width