Photovoltaics problem set, Exercises of Engineering

photovoltaics problem set from set 4

Typology: Exercises

2019/2020

Uploaded on 09/15/2021

schoolkid643643265
schoolkid643643265 🇺🇸

4 documents

1 / 2

Toggle sidebar

This page cannot be seen from the preview

Don't miss anything!

bg1
ECE/OPTI 414a/514a
Practice Problem Set #4
1. Assume a silicon PV cell with an ideality factor of 1.5 that has an Isc = 2.25A
at 25oC and a reverse saturation current of 1.30X10-9A.
a. Compute the corresponding open circuit voltage at 25oC.
b. Compute the short circuit current and open circuit voltage at 15oC and 60oC
using the temperature sensitivity factors discussed in class (use Voc and Isc
at 25oC for the normalization values.
2. The PV cell from Problem 1with T = 25oC now has a series resistance of
0.11Ω, and a shunt resistance of 450kΩ. Assume that Isc for the cell without
parasitic resistance is 2.25A.
a. Determine the FF without parasitic resistance.
b. Compute the FF as a result of series and shunt resistance (i.e. two FF’s one
with series resistance and one with shunt resistance.)
c. Now assume that the cell is operating with both types of parasitic
resistance. Find the new Vmpp, Impp, and Pmpp. (Hint: start with a value for
V~0.5Vmpp without parasitic resistance and iterate until the current is
consistent on both sides of the equation for I. Then increase the voltage
value until an approximate MPP value is found. It will require 4 or 5
iterations.)
3. The absorption of silicon (indirect bandgap) for a photon with energy of 2.5eV
is 4.5X103/cm. Compute the absorption coefficient at a wavelength of 700 nm.
Assume that the phonon energy involved in the transition at both wavelengths
is 0.05Eg. Assume that the material is at room temperature (300K).
4. Assume a p-n step junction in silicon with the p-type material doped at a
concentration of 1016/cm3 and the n-type material doped at 1018/cm3. The
intrinsic carrier density is 1.5X1010/cm3 and all dopants are fully ionized.
Assume that the effective density of states for silicon is
19
3.22 10
/cm3 for the
conduction band and
19
1.83 10
/cm3 for the valence band. Assume that the
temperature is 300K and silicon relative permittivity of 11.7.
a. Compute the hole concentration on the n-side and electron concentration
on the p- side of the junction;
b. Compute the built in potential across the junction;
c. Compute the width of the depletion region;
d. Compute is position of the Fermi level in the quasi-neutral n- and p-
regions relative to the conduction band edge.
e. Compute the maximum value for the electric field.
pf2

Partial preview of the text

Download Photovoltaics problem set and more Exercises Engineering in PDF only on Docsity!

ECE/OPTI 414a/514a

Practice Problem Set

  1. Assume a silicon PV cell with an ideality factor of 1.5 that has an Isc = 2.25A at 25oC and a reverse saturation current of 1.30X10-^9 A. a. Compute the corresponding open circuit voltage at 25oC. b. Compute the short circuit current and open circuit voltage at 15 oC and 60 oC using the temperature sensitivity factors discussed in class (use Voc and Isc at 25oC for the normalization values.
  2. The PV cell from Problem 1with T = 25 o C now has a series resistance of 0.11Ω, and a shunt resistance of 450kΩ. Assume that Isc for the cell without parasitic resistance is 2.25A. a. Determine the FF without parasitic resistance. b. Compute the FF as a result of series and shunt resistance (i.e. two FF’s one with series resistance and one with shunt resistance.) c. Now assume that the cell is operating with both types of parasitic resistance. Find the new Vmpp, Impp, and Pmpp. (Hint: start with a value for V~0.5Vmpp without parasitic resistance and iterate until the current is consistent on both sides of the equation for I. Then increase the voltage value until an approximate MPP value is found. It will require 4 or 5 iterations.)
  3. The absorption of silicon (indirect bandgap) for a photon with energy of 2.5eV is 4.5X10^3 /cm. Compute the absorption coefficient at a wavelength of 700 nm. Assume that the phonon energy involved in the transition at both wavelengths is 0.05Eg. Assume that the material is at room temperature (300K).
  4. Assume a p-n step junction in silicon with the p-type material doped at a concentration of 10^16 /cm^3 and the n-type material doped at 10^18 /cm^3. The intrinsic carrier density is 1.5X10^10 /cm^3 and all dopants are fully ionized. Assume that the effective density of states for silicon is 19 3.22  10 /cm^3 for the conduction band and 19 1.83 10 /cm^3 for the valence band. Assume that the temperature is 300K and silicon relative permittivity of 11.7. a. Compute the hole concentration on the n- side and electron concentration on the p- side of the junction; b. Compute the built in potential across the junction; c. Compute the width of the depletion region; d. Compute is position of the Fermi level in the quasi-neutral n- and p- regions relative to the conduction band edge. e. Compute the maximum value for the electric field.
  1. A silicon n+p junction operates at a temperature of 300K, has a relative permittivity of 11.7, an intrinsic carrier density of 10^10 /cm^3 , and has uniformly doped n and p sides with ND = 2 X 10^17 /cm^3 and NA = 5 X 10^15 /cm^3. i. Sketch the energy band diagram (in units of eV) without an applied bias potential or illumination. On the sketch show Ec, Ev, Ei, and EF on both sides of the junction. ii. Compute distances xn and xp, (i.e. the extent of the space charge regions on each side of the junction). iii. Below the energy band diagram plot the charge density, electric field, and voltage at corresponding distances from the junction. Also determine Vbi, EF – Ei on the n+ side, and EF – Ei on the p side of the junction.
  2. A slab of silicon is doped with 17 N^ D ^ 1.5^ ^10 /cm^3 atoms and is illuminated with a HeNe laser with an irradiance of 200mW/cm^2 at 632.8 nm. The intrinsic electron concentration in the silicon prior to doping is 1010 /cm^3. The absorption coefficient at the HeNe wavelength is 1.1X10^3 /cm. a. Determine the electron and hole concentrations prior to illumination; b. Determine the e-h pair density production rate at a depth of 50μm below the surface of the silicon with illumination. Account for reflection loss at the surface of the silicon. c. Determine the radiative recombination rate of the minority carriers at 50μm below the silicon surface assuming that the minority carrier lifetime is 0.1μsec. d. Assume that the illumination is stopped at t = 0. How long does it take for the minority carrier concentration to drop to 1/3 its initial value?
  3. For the n-type silicon slab described in problem 4 assume that single level trap recombination can also occur. The carrier capture cross section is 0.007 cm^2 ; thermal velocity of the electrons is 1.25X10^2 cm/sec, and the concentration of traps is 2X10^6 /cm^3. a. Assuming the same generation rate at 50μm below the silicon surface, determine the recombination rate due to single level trap mechanism. b. What is the total recombination rate if direct and single level trap (SLT) mechanisms take place simultaneously and what is the combined recombination lifetime?