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These lecture slides are part of Vacuum Pump course at Shree Ram Swarup College of Engineering
Typology: Slides
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1 atm= 760 torr = 1.0132 bar = 1.013x
Pa = 14.7 psi^5
Rough Vacuum (RV)
1 torr โ 760 torr
Medium Vacuum (MV)
(^10) - torr โ 1 torr
High Vacuum (HV)
(^10) - torr โ 10 (^) torr-
Ultrahigh Vacuum (UHV)
<10 - torr^
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Vacuum conductance:
C (^) (liter/sec)
Vacuum impedance:
Gas flow (Throughput):
In series: Analogous to electrical conductance
In parallel:
i^ โ^ = โ= i
total i i
total C
C Z
Z 1
1
i^ โ^ = โ= i
total ii^
total C
C Z
Z 1
1
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2
128
2
L (^1) PP (^4) D
C
โ ฮท ฯ
Molecular flow^ Viscous flow
L D
M Tk
C B 3
(^621) ฯ โ
air @ RT
)( )](
(^10) [
sec)/
(
cm 4 L cmD
literC^ โ
air @ RT
)( )](
(^10) [
sec)/
(
cm 3 L cmD
literC^ โ
Maximize (^) D , minimize
(^) L , avoid bending
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Black list of high vapor pressure elements: Mg, Yb, Li, Sr, Sb, Ca, Bi, BaBr, I, Hg, S, Cs, Rb, K, P, Se, Cd, Na, As, Zn, Te,
Outgassing Dry NBakeoutChoice of materials (^2) venting
Electron / plasma bombardment of chamber inner surfaceCoating of getter material (Ti, Nbโฆ)
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Surface impact rate
sec
/
0 )
( 2
2 cm^21
torrP รร BTmk P
โ โ ฯ
Surface with 1 monolayer of gas Assuming a sticking coefficient of 1, time to cover a clean
)
( 104 torr 6 P ร โ โ
torr, lifetime-^
(^) ~ 4 sec
torr,^
~ 6 min
torr,^
~ 11 hr
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(^10) -2 Single-stage torr^
(^10) -3 Dual-stage torr^
Foreline trap: copper gauze, molecular sieve, LNOil: lubricant, coolant, sealant, contamination Speed: 1-100 cfm
2
Venting;
Exhaust;
Vibration
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torr-^
Drawback:Oil free, no moving parts Gas selective- difficulty w/ inert gasesNeed regeneration
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(^10) -4 Gas transfer Roots torr when backed^
Handle high gas loads
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torr
12-25 cfm
(^10) -3 Gas transfer Screw torr^
May handle aggressive gases30-320 cfm
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torr-^
Gas selective: difficulty w/ HCrossover P: ~ 1000 mtorr50 L/s - 3500 L/s
(^2) , He
Easy w/hydrocarbon
BearingsOften verticalHigh speed, screen Magnetically levitatedCeramic
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(^10) -9 Closed-cycle He cryocompressor Cryo-condensation + cryo-sorption torr or better^
Regeneration & replacementGas selective: difficulty w/ HeCrossover P: ~ 200 mtorrNo backing neededAny orientation
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Chemical reaction w/ Ti (getter) + burial (ion implantation) Reactive gases
All gases
torr^
Low throughputGas selective: difficulty w/ inert gasPermanent magnet: ionization; heavyClean, bakeable, vibration-freeAny orientationCross over P: ~<1mtorr
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