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Memory Technology
Oct. 20, 1998
Topics
- Memory Hierarchy Basics
- Static RAM
- Dynamic RAM
- Magnetic Disks
- Access Time Gap
class17.ppt
Computer System
diskDisk Disk disk
Memory-I/O busMemory-I/O bus
ProcessorProcessor
CacheCache
MemoryMemory
I/O
controller
I/O
controller
I/O
controller
I/O
controller
I/O
controller
I/O
controller
DisplayDisplay NetworkNetwork
Reg
Scaling to 0.1μm
- Semiconductor Industry Association, 1992 Technology Workshop
- Projected future technology based on past trends
Year 1992 1995 1998 2001 2004 2007
Feature size 0.5 0.35 0.25 0.18 0.12 0.
- Industry is slightly ahead of projection
DRAM cap 16M 64M 256M 1G 4G 16G
- Doubles every 1.5 years
- Prediction on track
Chip cm^2 2.5 4.0 6.0 8.0 10.0 12.
- Way off! Chips staying small
Static RAM (SRAM)
Fast
Persistent
- as long as power is supplied
- no refresh required
Expensive
- ~$100/MByte [1995]
- 6 transistors/bit
Stable
- High immunity to noise and environmental disturbances
Technology for caches
SRAM Cell Principle
Inverter Amplifies
- Negative gain
- Slope < –1 in middle
- Saturates at ends
Inverter Pair Amplifies
- Positive gain
- Slope > 1 in middle
- Saturates at ends V V
Vin
0 0.2 0.4 0.6 0.8 1
0
1
Vin V
V
Slope < –
Slope > 1
Bistable Element
Stability
- Require Vin = V
- Stable at endpoints
- Metastable in middle
Ball on Ramp Analogy
Vin V
V
Vin V
Vin
0 0.2 0.4 0.6 0.8 1
0
(^1) Stable
Metastable
Stable (^0) 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1
Dynamic RAM (DRAM)
Slower than SRAM
- access time ~70 ns [1995]
Nonpersistant
- every row must be accessed every ~1 ms (refreshed)
Cheaper than SRAM
- ~$1.50 / MByte [1998]
- 1 transistor/bit
Fragile
- electrical noise, light, radiation
Workhorse memory technology
Anatomy of a DRAM Cell
Word Line
Bit Line
Storage Node
Access Transistor (^) C node
CBL
Writing
Word Line
Bit Line
Reading
Word Line
Bit Line
∆V ~ Cnode / CBL
V Storage Node
Example 2-Level Decode DRAM (64Kx1)
Row address latch
Row address latch
Column address latch
Column address latch
Row decoder
Row decoder 256x cell array
256x cell array
column latch and decoder
column latch and decoder
A7-A
\
\
R/W’
Dout Din
CAS
RAS
row
col
256 Rows
256 Columns column sense/write amps
column sense/write amps
Provide 16-bit address in two 8-bit chunks
DRAM Operation
Row Address (~50ns)
- Set Row address on address lines & strobe RAS
- Entire row read & stored in column latches
- Contents of row of memory cells destroyed
Column Address (~10ns)
- Set Column address on address lines & strobe CAS
- Access selected bit
- READ: transfer from selected column latch to Dout
- WRITE: Set selected column latch to Din
Rewrite (~30ns)
Enhanced Performance DRAMs
Row addresslatch
Row addresslatch
Column address latch
Column address latch
Row decoder
Row decoder (^) 256x cell array cell array256x
sense/write amps
sense/write amps
column latch and decoder
column latch and decoder
A7-A
(^8) \
(^8) \
R/W’
CAS
RAS
row
col
Entire row buffered here
row access time col access time cycle time page mode cycle time 50ns 10ns 90ns 25ns
Conventional Access
- Row + Col
- RAS CAS RAS CAS ...
Page Mode
- Row + Series of columns
- RAS CAS CAS CAS ...
- Gives successive bits
Other Acronyms
• EDORAM
- “Extended data output”
- SDRAM
- “Synchronous DRAM” Typical Performance
Performance Enhanced for Video / Graphics Operations
- Frame buffer to hold graphics image
Writing
- Random access of bits
- Also supports rectangle fill operations
- Set all bits in region to 0 or 1
Reading
- Load entire row into shift register
- Shift out at video rates
Performance Example
- 1200 X 1800 pixels / frame
- 24 bits / pixel
- 60 frames / second
- 2.8 GBits / second
256x cell array
256x cell array
Shift RegisterShift Register
column sense/write amps
column sense/write amps
Video Stream Output
Video RAM
DRAM Storage Capacitor
d
Dielectric Material Dielectric Constant ε
Plate Area A
C = ε A/d
Planar Capacitor
- Up to 1Mb
- C decreases linearly with feature size
Trench Capacitor
- 4–256 Mb
- Lining of hole in substrate
Stacked Cell
- > 1Gb
- On top of substrate
- Use high ε dielectric
Trench Capacitor
Process
- Etch deep hole in substrate
- Grow oxide on walls
- Fill with polysilicon plug
- Tied to storage node Storage Plate Reference Plate
SiO 2 Dielectric