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Material Type: Notes; Professor: Schubert; Class: MICROELECTRONICS TECHNOLOGY; Subject: Electrical & Comp. Sys. Engr.; University: Rensselaer Polytechnic Institute; Term: Spring 2005;
Typology: Study notes
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We make the analysis in 1 dimension, even though actual diodeas shown may not be a one-dimensional system. This makes theanalysis simple. The metallurgical junction is located at
x^
p
n
n
D
p
A
0 s
where
d d
x x
x x
x x
q
x x
q
x
< < − ε − = ε =ε
E
p^
n
− x
p^
x n
W^ E
max
q N
x A
/εp
q N
x D /εn
( )
n
p
n
n D
p
p A 0
x x ; x x
x x
x x
qN
o x x
x x
qN
x
≤ ≤ − ε − =
≤ ≤ − + ε − = E
bi
dx x
dV dx
x x
or
n p
bi^
= V bi^
{area under
versus
x^
curve}
q N
x D
/n ε) }
q^
ε)
x D
W n
D
A
A
n
D
A
D A^
since
2
N W x W N N
q
2 1 bi
D A
D
A
2
/ V
N N
q
ε
=
n
n D
bi
p
p A
n p
n D
p
p A
zero to set
at
potential
reference the with
d d
x x
x x
qN
V
x x
x x
qN x V
x x
x x
x x
qN
x x
)x
x(
qN V x
)
≤ ≤ − ε − =
≤ ≤ − + ε =
≤ ≤ − + ε =
x V bi
Consider the diode of Example 1. Calculate the depletion layerwidth and the maximum electric field if a reverse voltage of 10 Vis applied across the diode. Calculate the depletion layer width inthe n-side and p-side under this biased condition.What will be
if
What happens if we apply
A^
V bi