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Material Type: Notes; Class: MICROELECTRONICS TECHNOLOGY; Subject: Electrical & Comp. Sys. Engr.; University: Rensselaer Polytechnic Institute; Term: Fall 2006;
Typology: Study notes
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1
pnp transistor, steady state, low-level injection. Only drift and diffusion, no external generations One dimensional etc.
Assumptions:
General approach is to solve minority carrier
The goal is to relate transistor performance parameters
p x
p D t
p
τ
(^2) p
2 p L (^2) n
2 n G
n x
n D t
n
τ
and ∂∆
2
Under steady state and when G L= 0,
(^2) n
2 n (^) τ =
∂ ∆ n x
n 0 D (^2) p
2 p (^) τ =
∂ ∆ p x
p D and
For the base in pnp, we are interested only in holes.
p 2
2 p = τ
∂ ∆ p x
p D
The rigorous analysis is carried out in chapter 11, but we are going to take a more simplified approach.
3
These parameters can be related to device parameters such as doping, lifetimes, diffusion lengths, etc.
−
I EP
I BR
4
n 0 , p 0 – under thermal equilibrium n , p – under arbitrary conditions, functions of t
∆ n = n – n 0 ∆ p = p – p 0
Low-level injection condition is assumed.
∆ n and ∆ p are deviations in carrier concentrations from their equilibrium values. ∆ n and ∆ p can be both positive or negative. ∆ n and ∆ p are termed excess carriers – excess above the equilibrium concentration.
Majority carriers are electrons in n-type material and holes in p-type material.
7
I n = q A D E d∆ n /d x E = – ( q A D E/ L E ) ∆ n E(0) I p = – q A D B d∆ p /d x B = ( q A D B/ L B) ∆ p B(0)
Total current I = I P + (– I N) (“–” because x E and x B point in opposite directions)
= ( q A D B/ L B) ∆ p B(0) + ( q A D E/ L E) ∆ n (^) E (0)
= ( q A D B/ L B) p B0 [ exp ( q V EB / kT ) – 1 ] +
≈ ( q A D B/ L B) p B0 exp ( q V EB/ kT ) + ( q A D E/ L E) n E0 exp ( q V EB/ kT )
Note : I p and I n can also be calculated based on the fact that Q p has to be replaced every τ B seconds Î I p = Q p / τ B and I n = Q n / τ E and I E = I P + I N
8
Consider the carrier distribution in a forward active pnp transistor
n E0^ p B
n C
Emitter Base Collector
n C(0)
p B(0)
n E(0)
9
n E0 , p B0 and n C0 = equilibrium concentration of minority carriers in emitter, base and collector
n E(0), p B(0) and n C(0) = minority carrier concentration under forward active conditions at the edge of the respective depletion layers
∆ n E (0), ∆ p B(0) and ∆ n C(0) = excess carrier concentration at the edge of the depletion layers
(p+)
(n)
(p)
10
∆ n E (0) = n E (0) – n E0 = n E0 [exp ( q V EB / kT ) – 1]
∆ p B (0) = p B (0) – p B0 = p B0 [exp (q V EB / kT ) – 1]
By taking the slopes of these minority carrier distribution at the depletion layer edges and multiplying it by “ q A D n,p ”, we can get hole and electron currents.
Note that I n = q A D n (d n / d x ) and I p = – q A D p (d p / d x )
13
Emitter Current (cont.)
I EN corresponds to electron current injection from base to emitter since E-B junction is forward biased.
I EN = q A ( D (^) E / L E) n E0 [exp ( q V EB / kT ) – 1 ] ≈ q A ( D (^) E / L E) n E0 [exp ( q V EB / kT )] ---- (C)
14
Base Current, I B
-supplies electrons for recombination in base -supplies electrons for injection to emitter
q A ( D (^) E / L E) n E0 exp ( qV EB / kT )
( recombination) + (electron injection to emitter)
Now we can find transistor parameter easily.
15
Base transport factor , α (^) T
(same as eq. 11.42 in text)
B B 0 B
E E 0 E /
/ 1
1
D p W
D n L
=
2
B
B 0 EB B B
EB B B 0 B
B
EB B 0 B
B
EP
T C
2
1 1
1 exp 2
exp
exp
⎟⎟ ⎠
⎞ ⎜⎜ ⎝
⎛
=
τ ⎟+ ⎠
⎞ ⎜ ⎝
⎛
⎟ ⎠
⎞ ⎜ ⎝
⎛
α = =
L
W kT
qV p qAW kT
qV p W
qAD
kT
p qV W
qAD
I
I
Emitter injection efficiency, γ
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Î n E0 = n i^2 / N E … doping in emitter Î p B0 = n i^2 / N B … doping in base
B E E
E B B B E B
D L p
D W n
γ = (Eq 11.41 in textbook)