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Memory 1997 - sec07, Notas de estudo de Automação

Complete Coverage of DRAM, SRAM, EPROM, and Flash Memory ICs,of © 1997 Integrated Circuit Engineering Corporation

Tipologia: Notas de estudo

2011

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OVERVIEW
DRAM (Dynamic Random Access Memory) is the main memory used for all desktop and larger
computers. Each elementary DRAM cell is made up of a single MOS transistor and a storage
capacitor (Figure 7-1). Each storage cell contains one bit of information. This charge, however,
leaks off the capacitor due to the sub-threshold current of the cell transistor. Therefore, the charge
must be refreshed several times each second.
HOW THE DEVICE WORKS
The memory cell is written to by placing a “1” or “0” charge into the capacitor cell. This is done
during a write cycle by opening the cell transistor (gate to power supply or VCC) and presenting
either VCC or 0V (ground) at the capacitor. The word line (gate of the transistor) is then held at
ground to isolate the capacitor charge. This capacitor will be accessed for either a new write, a
read, or a refresh.
Figure 7-2 shows a simplified DRAM diagram. The gates of the memory cells are tied to the
rows. The read (or write) of a DRAM is done in two main steps as illustrated in Figure 7-3. The
row (X) and column (Y) addresses are presented on the same pads and multiplexed. The first
step consists of validating the row addresses and the second step consists of validating the
column addresses.
INTEGRATED CIRCUIT ENGINEERING CORPORATION
7-1
7DRAM TECHNOLOGY
Word Line
Bit Line
Transistor
Capacitor
Plate
Source: ICE, "Memory 1997"
19941
Figure 7-1. DRAM Cell
pf3
pf4
pf5
pf8
pf9
pfa
pfd
pfe
pff
pf12
pf13
pf14
pf15
pf16
pf17
pf18
pf19
pf1a
pf1b
pf1c
pf1d

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OVERVIEW

DRAM (Dynamic Random Access Memory) is the main memory used for all desktop and larger

computers. Each elementary DRAM cell is made up of a single MOS transistor and a storage

capacitor (Figure 7-1). Each storage cell contains one bit of information. This charge, however,

leaks off the capacitor due to the sub-threshold current of the cell transistor. Therefore, the charge

must be refreshed several times each second.

HOW THE DEVICE WORKS

The memory cell is written to by placing a “1” or “0” charge into the capacitor cell. This is done

during a write cycle by opening the cell transistor (gate to power supply or VCC) and presenting

either VCC or 0V (ground) at the capacitor. The word line (gate of the transistor) is then held at

ground to isolate the capacitor charge. This capacitor will be accessed for either a new write, a

read, or a refresh.

Figure 7-2 shows a simplified DRAM diagram. The gates of the memory cells are tied to the

rows. The read (or write) of a DRAM is done in two main steps as illustrated in Figure 7-3. The

row (X) and column (Y) addresses are presented on the same pads and multiplexed. The first

step consists of validating the row addresses and the second step consists of validating the

column addresses.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

Word Line

Bit Line

Transistor

Capacitor

Plate

Source: ICE, "Memory 1997" 19941

Figure 7-1. DRAM Cell

7-2^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

Data

Data

Sense Amplifier

Data

Data

Sense Amplifier

Data

Data

Sense Amplifier

Data

Data Sense Amplifier

Output Buffer

Dout

Y Decode

CAS

Y

X

RAS

Address Pads Row Decode

Source: ICE, "Memory 1997" 22430

Din Input Buffer

Figure 7-2. Simplified DRAM Diagram

Figure 7-3. DRAM Access Timing

Step I

Row Access

Step II

Column Access

Address Row Column

RAS

CAS

Source: ICE, "Memory 1997" 22431

For standard DRAMs there are three ways to perform refresh cycles. They are RAS-only refresh,

CAS-before-RAS refresh, and hidden refresh. To perform a RAS-only refresh, a row address is put

on the address lines and then RAS goes low. To perform a CAS-before-RAS refresh, CAS first goes

low and then a refresh cycle is performed each time RAS goes low. To perform a hidden refresh

the user does a read or write cycle and then brings RAS high and then low.

MEMORY CELL

A great deal of design effort has been made to shrink the cell area, particularly, the size of the

DRAM capacitor. As memory density increases, the cell size must decrease. Designers have man-

aged to shrink overall cell size. However, due to factors such as noise sensitivity and speed, it has

been a challenge to reduce the capacitance. The capacitance must stay in the range of 30fF.

The charge (Q) stored in a capacitor is equal to capacitance times voltage (Q = C x V). Over the

years, DRAM operating voltage has decreased (i.e., 12V to 5V to 3.3V). As voltage decreases, the

stored charge will also decrease. Design improvements allow for the decrease in the cell charge

as long as the capacitance remains in the range of 30fF.

Two main developments are used to reduce capacitor area without reducing its value. These are

the use of new capacitor shapes to fit into a minimum chip surface area and increasing the

dielectric constant.

Memory Cell Shape

The 1Mbit DRAM generation was the first to abandon the classical planar capacitor and replace it

with a trench or a stacked capacitor. Figure 7-5 shows the feature sizes of some of the DRAM

devices that ICE analyzed in its laboratory these two last years. Trench capacitors are not widely

used in spite of continual research and development on that type of design. As shown, the major

64Mbit DRAMs available on the market are today made of stacked capacitors.

7-4^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

Distributed Refresh

Burst Refresh

Each Pulse Represents a Refresh Cycle

Time Required Time To Complete Refresh Of All Rows

Source: Micron, "Memory 1997" 20843

Figure 7-4. Burst and Distributed Refresh

Cross sections of 64Mbit DRAMs analyzed by ICE’s laboratory illustrate three major choices for

manufacturing DRAM memory cells. Hitachi uses a stacked, multi-layer capacitor for its 64Mbit

DRAM (Figure 7-6). The trench capacitor (Figure 7-7) is used by IBM/Siemens, and the simple

stack capacitor (Figure 7-8, and 7-9) is preferred by Samsung and NEC.

Figure 7-10 shows how size cell improvements will be necessary for the next DRAM generations.

Figure 7-11 illustrates the stacked capacitor structure evolution. The decrease of cell size without

decreasing capacitor value results in increasing complexity of memory cell technology. Most lead-

ing DRAM manufacturers are working on 1Gbit cells. Their goal is to decrease the size of the cell

without compromising the value of the capacitor.

Two types of 1Gbit cell developments are shown in the next figures. Toshiba tried to improve the

trench capacitor concept by creating a bottle-shape trench design (Figure 7-12). Hitachi tried to

improve the stack concept with a vertical and circular capacitor (Figure 7-13). NEC received a

patent from the U.S. Patent Office for its proprietary HSG (hemispherical-grain) silicon technology.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

Source: ICE, "Memory 1997" 22432

Fujitsu Mosel-Vitelic

NEC IBM/Siemens Samsung

Mitsubishi Hitachi

16M

4M

64M

64M

64M

16M

64M

Stacked Stacked

Stacked Trench Crown

Stacked Stacked

Density Date Code Cell Area μm^

Die Area mm^

Name Gate Length Cell Type

Figure 7-5. Physical Dimensions of DRAMs

Figure 7-6. Hitachi 64Mbit DRAM Cross Section

Photo by ICE, “Memory 1997” 19814

CAPACITOR DIELECTRICS

The inability to scale the capacitor value has led to the consideration of new dielectric materials for

the capacitor. It is likely that materials with higher dielectrics will see more use. Many of the mate-

rials have proven track records through their use as dielectrics in discrete capacitors. Therefore, the

main challenge is the introduction of these materials into the IC process. Figure 7-14 shows some

of the materials under consideration. Tantalum Pentoxide (Ta 2 O 5 ) has been viewed in several of

the 64Mbit DRAMs analyzed by the ICE laboratory. Ta 2 O 5 seems that it could serve as a good

dielectric since it can easily be integrated into conventional stack capacitor structure. However, it

requires higher dielectric thickness, resulting in only a marginal improvement in capacitance.

PERFORMANCE

Compared with other memory ICs, DRAMs suffer from a speed problem. The on-chip circuitry

required to read the data from each cell is inherently slow. As such, DRAM speeds have not kept

pace with the increased clock speed of CPUs.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

256K 1M 4M 16M 64M 256M 1G 4G

10 -

1

10 1

102

103 10

DRAM Generation (bits)

Chip Area (mm

2 ), Cell Area (

μ

m

2 )

Minimum Feature Size (

μm

2 )

Source: Hitachi/ICE, "Memory 1997" 20775A

Cell Area

Chip Area

Minimum Feature Size

Figure 7-10. DRAM Technology Trend

7-8^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

Planar

Cup

Simple Stack

Simple Crown

HSG Crown

Multilayer Fin

Multilayer Crown

Source: IBM/Semiconductor International/ICE, "Memory 1997" 22435

Figure 7-11. Stack Capacitor Structure Evolution

Figure 7-12. Capacitor Manufacturing Process

Si RIE In-situ Doped Poly-Si Deposition

Annealing

Impurity Doping Into the Plate Electrode

Chemical Dry Etching

Source: Toshiba/ICE, "Memory 1997" 20767

Fast Page Mode DRAMs

To access DRAM data, a row address is applied, followed by a column address. The addresses of

a DRAM are multiplexed on the same package pins. When requested data is stored in the same

row as previously requested data, merely changing the column address allows access to this new

data. Therefore, with fast page mode, the data of the same row can be accessed by changing only

the column address.

As an example, consider a 1Mbit DRAM that has an array organization of 1,024 x 1,024 bits. 1,

bits of data belong to the same row. This data will be accessible through fast page mode (a row is

considered a page). This mode is available on all the standard DRAMs. As described previously,

this access time is as fast as the data available in the sense amplifier.

7-10^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

Source: ICE, "Memory 1997" 22450

Standard

Cache

Synchronous

Cache Synchronous

Video

Pseudo Static

Other Configurations

Other Technology

DRAM

FPM (Fast Page Mode) EDO (Extended Data Out) BEDO (Burst EDO) ARAM (Audio RAM)

EDRAM (Enhanced DRAM) CDRAM (Cache DRAM)

SDRAM (Synchronous DRAM)

SDRAM II or DDR DRAM (Double Data Rate DRAM)

SGRAM (Synchronous Graphic DRAM)

ESDRAM (Enhanced SDRAM)

VRAM (Video RAM) WRAM (Window RAM)

PSDRAM (Pseudo Static RAM) Fusion

RDRAM (Rambus) SLDRAM (SyncLink) 3D

nDRAM (Next Generation) MDRAM (Multi Bank)

FRAM (Ferroelectric DRAM)

Figure 7-15. Current DRAM Varieties

Static column mode is similar to page mode except that only the column address needs to be

changed to obtain the new data, and no CAS pulse is needed. Nibble mode groups memory cells

in “four bits per nibble” so that whenever one bit is selected, four serial bits appear. This mode is

no longer widely used.

Extended Data Out (EDO) DRAMs

Extended data out DRAMs (EDO DRAMs), also called hyper-page-mode DRAMs, represent a

small design change in the output buffer relative to a standard fast page mode DRAM. The old

data is latched at the output while new data is addressed. EDO shortens the effective page mode

cycle time as the valid data output time is extended.

For the same technology, a product in standard mode may have a cycle time of 110ns (access time

of 60ns). This cycle time will be reduced to 40ns in fast page mode and to 25ns in EDO mode.

Burst EDO DRAMs

Several vendors offer burst versions of the EDO DRAM. The “burst” refers to the fact that all read

and write cycles occur in bursts of four, automatically sequenced by the memory chip. To accom-

plish that, a special pipeline stage and a two-bit counter are added.

The Burst EDO DRAM read access time differs from EDO DRAM in two ways. First, as the output

latch is replaced by a special pipeline stage (register), the latency will be higher but the bandwidth

will be better. Second, as the Burst EDO DRAM includes an internal address counter, only the ini-

tial address in a burst of four needs to be provided.

Manufacturers may use the same mask set for their fast page mode EDO and burst EDO DRAMs.

A wire bond option determines which product is in the final package. Figure 7-16 shows timing

differences between the various standard DRAMs. Figure 7-17 shows speed differences.

Audio DRAMs

Due to process defects during wafer probe, some DRAMs wind up with a few failed storage cells

that cannot be effectively repaired (or replaced) by the redundancy mechanism. These cannot

be sold as good devices to PC OEMs. However, a few defective bits do not affect an audio appli-

cation where there is a tolerance for error. For this reason manufacturers may sell parts with few

bad cells for use in audio applications. These devices are called Audio DRAM (ARAM). The

client can buy ARAMs cheaper than a standard DRAM.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

Enhanced DRAMs

Enhanced DRAMs (EDRAMs) were developed by Ramtron Corporation. The EDRAM is also sold

by IBM (3.3V and 5V parts), as IBM and Ramtron have a second source agreement for this prod-

uct. The EDRAM architecture is similar to a standard 4Mbit page mode or static column DRAM

with the addition of an integrated L2 SRAM cache and internal control. Technically, the EDRAM

is a cache DRAM (CDRAM). Rather than integrate a separate SRAM cache, the EDRAM takes

advantage of the internal architecture of a standard fast page mode DRAM, which has sense

amplifiers that act like a 2Kbit SRAM cache when reading and accessing data.

Memory read cycles always occur from the cache. When the comparator detects a hit, only the

SRAM is addressed where data is available in 15ns. When a miss is detected, the entire cache is

updated and data is available at the output within a single 35ns access. Figure 7-19 shows the chip

organization of an EDRAM.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

SRAM

Address

Address Latch

Address Latch

4K x 4 Fast SRAM Cache

Clock

Cache Hit

CS, Write Enable

Control

Refresh

Multiplexed DRAM Address

DRAM

Control

1M x 4 DRAM Array

64-Bit Buffer 64-Bit Buffer Data

Source: EBN/ICE, "Memory 1997" 20756

Figure 7-18. Cache DRAM

Column Address Latch

Last Row Read Address Latch

Row Address Latch

Flow Address and Refresh Counter Refresh Address

512 x 4 Page Cache (SRAM)

Column Decoder

Sense Amps and Write Select

DRAM Array (2,048 x 512 x 4)

Read Data

Write Data

Ground

Set

Write Enable

Data

I/O

Control and Data Latches

Column Access Signal

Address Lines

Refresh Control Pin Read/Write Control Row Access Signal Source: EBN/ICE, "Memory 1997" 20757

Figure 7-19. Enhanced DRAM (EDRAM)

Synchronous DRAMs

Synchronous DRAMs represent the next step in the evolution of the industry standard DRAM

architecture. Synchronous DRAMs (SDRAMs) have their read and write cycles synchronized

with the processor clock. The SDRAM is designed with two separate banks. These two indepen-

dent banks allow each bank to have different rows active at the same time. This allows concur-

rent access/refresh and recharge operations. Figure 7-20 presents a block diagram organization

of an SDRAM.

The SDRAM is programmed using a mode register. The programmable features include burst

length (1, 2, 4, 8, full page), wrap sequence (sequential/interleave), and CAS latency (1, 2, 3).

Figure 7-21 shows an SDRAM timing sequence. This timing illustrates the different possibilities

of CAS latency and of burst length.

7-14^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

Figure 7-20. 4Mbit SDRAM Block Diagram

Input Latch /Buffer

Output Latch

Output Latch

Output Buffer

Data Bus

Control Logic and Timing Generator

Address Bus

Burst Counter Column Address Latch Row Address Latch

Refresh Counter

MUX

Row Decorder Row Decorder

Memory Array Bank 0 Memory Array Bank 1 ColumnDecoder Sense Amps

ColumnDecoder Sense Amps

Columns

Columns

CAS

Latency Control

512 Rows 512 Rows

Mode Register

A9-A

A

A9 A7-A0 A9-A

A9-A

DQMUDQMLWE#CAS#RAS#CS#CKECLK

Source: Hitachi/ICE, "Memory 1997" 22437

7-16^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

F.P. = Full Page R = Reserved (inhibit)

A9 A8 A7 A6 A5 A4 A3 A2 A1 A OPCODE 0 LMODE BT BL

A 0 0 0 0 1

A 0 0 1 1 X

A 0 1 0 1 X

CAS Latency R 1 2 3 R

A 0 1

Burst Type Sequential Interleave

A2 A1 A

0 0 0 0 1 1 1 1 0 0 1 1 0 0 1 1 0 1 0 1 0 1 0 1 R 2 4 8 R R R

F.P.

BT=0 BT= R 2 4 8 R R R R

Burst Length

A 0 0 1 1

A 0 1 0 1

Burst Read and Burst Write R Burst Read and Single Write R

Write Mode

Source: Hitachi/ICE, "Memory 1997" 22438

Figure 7-22. Register Content of a 4Mbit SDRAM

Figure 7-23. SDRAM Functionality

CLK: External Clock Input and Synchronous DRAM Operations Synchronize with this Signal

Command: Controls Synchronous DRAM Operation Command is a Combination of CS, RAS, CAS, and WE Signals.

Active Read

Row Column

BS BS

Bank Select: A Memory Contains 2 Banks (Areas) that can be Controlled Independently. BANK SELECT is used to Select a Bank.

Command (CS,RAS,CAS,WE)

CLK

Address (A0 to A8)

Bank Select (A9)

Dout Out 0 Out 1 Out 2 Out 3

CAS Latency = 3 Burst Length = 4

CAS Latency: Clock Numbers from Read Command Set to Data Output

Burst Length: Possible Consecutive Input/Output Data Length

Active Command Set Cycle

Read Command Set Cycle

Source: Hitachi/ICE, "Memory 1997" 22440

Synchronous Graphics RAMs

Synchronous Graphics RAMs (SGRAMs) target video applications. SGRAMs differ from

Synchronous DRAMs (SDRAMs) in that they provide features traditionally associated with video

DRAMs such as 32-bit-wide bus and graphics-specific features such as block write mode and a

masked write mode. Figure 7-24 shows the chip organization of an SGRAM.

Enhanced Synchronous DRAMs

Enhanced Memory Systems Inc., a subsidiary of Ramtron, developed its Enhanced Synchronous

DRAMs (ESDRAM). This memory combines the features of SDRAM plus cache SRAM on the same

chip. 16Mbit ESDRAM combines two banks of 8Mbit SDRAM plus two banks of 4Kbit SRAM.

Video DRAMs

Video DRAMs (VRAMs) are also called Dual-Port DRAMs. VRAMs are almost exclusively used

for video applications. Since the standard DRAM is inherently parallel and video data is inher-

ently serial, graphics systems have always needed parallel to serial shift registers. A VRAM has

separate parallel and serial interfaces. For example, a 4Mbit DRAM may be organized as:

DRAM: 262,144 Words X 16 bits

SAM (Serial Access Memory): 256 Words X 16 bits

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

Multiplexed Address (^) Address Register

Refresh Counter (^) Row Address

Column Address

DRAM Memory Array 2M x 16 (one or two banks)

Data I/O Buffer

Timing and Control Logic

Clock (^) Clock Enable

Row Access Signal

Column Access Signal

Write Enable

Data

Source: EBN/ICE, "Memory 1997" (^20763)

Color Register

Mask Register

32 Bits

Figure 7-24. Synchronous Graphic DRAM

Although they have been available for more than 15 years, the PSRAMs market has never grown

strongly. Moreover, it seems that the PSRAM market may be shriveling as Hitachi and Toshiba,

the two major suppliers withdraw support. Figure 7-27 provides a comparison of PSRAMs and

low-power SRAMs.

Fusion Memories

Integrated Device Technology (IDT) developed a pseudo static DRAM and SRAM and labeled it

fusion memory. IDT claims that fusion memory is the first architecture to fuse together SRAM

performance at DRAM density and cost.

INTEGRATED CIRCUIT ENGINEERING CORPORATION 7-

512 Row Add Decoder

512 Column Decoder x 32

512 Sense Amps x 32

DRAM

32 Planes 512 x 512 Latch 0 Latch 1 Latch 2 Latch 3 SRAM Array 8 x 8 x 32 Write and Byte Mask Control

Color Reg 0 Color Reg 1

I/O Sense Amp x 32

256-Bit Internal Data Bus

8:1 Mux

32 DQ Lines

Serial Out

2:1 Mux 16

32 Data Buffers

Source: EBN/ICE, "Memory 1997" (^20755)

Figure 7-26. Window DRAM

4M

SRAM

4M

PSRAM

55ns

90mA 15 μa @ 2V 4x

80ns

75mA 15 μa @ 3V 1.2x

Source: ICE, "Memory 1997" 18742

Access Time

Operating Current Data Retention Power Relative per Bit Cost (DRAM = 1)

Figure 7-27. Static and Pseudo Static RAM Comparison

Rambus DRAMs

Rambus technology is based on very high speed, chip-to-chip interface that is incorporated on a

new DRAM architecture and on processors or controllers. The Rambus architecture achieves a

performance level more than ten times greater than conventional DRAMs. Rambus Inc. does not

manufacture products but licenses its design of Rambus DRAMs (RDRAMs) and controllers. To

date, Rambus has licensed over one dozen of the world’s largest semiconductor companies to

jointly develop and bring to market a wide range of memory and logic products. Further, it won

the support of Intel for the next-generation of DRAM architecture in PC systems.

Unlike other approaches that have focused on increasing the speed of individual DRAMs,

Rambus provides a complete system-level solution by integrating fast components with an inno-

vative high-speed interface technology. Figure 7-28 shows the Rambus technology elements. This

architecture is comprised of three main elements that include the Rambus Channel, the Rambus

Interface (controller), and the RDRAMs.

The Rambus Channel

Figures 7-29 through 7-31 show the configuration and the main characteristics of the Rambus

Channel. The Rambus Channel is the core of Rambus’ architecture. The goal of this channel is to

transmit information at a very high rate. For that to occur, the conventional TTL level signals are

replaced by small swing (600mV) signals plus an additional reference signal (Vref) set to be the

mid-point of the swing. These low-speed signals reduce bus power consumption, noise, and

increase the speed transfer.

7-20^ INTEGRATED CIRCUIT ENGINEERING CORPORATION

CPU

Controller (ASIC)

RDRAM 1 RDRAM 2 RDRAM 3 RDRAMn

Rambus Channel

Source: ICE, "Memory 1997" 22443

Figure 7-28. Typical Rambus Configuration