4 replies
dharamnishth
almost 13 years ago

• Profilometry is a very common method of film thickness measurement.
• In this technique, a step feature in the grown or deposited film is first created, either by masking during deposition or by etching afterward.
• The profilometer then drags a fine stylus across the film surface.
• When the stylus encounters a step, a signal variation indicates the step height.
• This information is then displayed on a chart recorder or CRT screen.
• Films of thicknesses of less than 100 nm to greater than 5 mm can be measured with this instrument. Source: http://in.docsity.com/en-docs/Silicon_Oxidation-Fundamentals_of_Semiconductor_Fabrication-Lecture_Slides_
• In this technique, a step feature in the grown or deposited film is first created, either by masking during deposition or by etching afterward.
• The profilometer then drags a fine stylus across the film surface.
• When the stylus encounters a step, a signal variation indicates the step height.
• This information is then displayed on a chart recorder or CRT screen.
• Films of thicknesses of less than 100 nm to greater than 5 mm can be measured with this instrument. Source: http://in.docsity.com/en-docs/Silicon_Oxidation-Fundamentals_of_Semiconductor_Fabrication-Lecture_Slides_
akshita
almost 13 years ago
to see other 2 answers
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